Versatile Pulsed Laser Deposition and Thermal Evaporator System – PLD-T is a high vacuum thin film deposition system enables to deposit different materials by both Pulsed Laser Deposition and so Thermal Evaporation technique. It can deposit complex materials and crystalline structures onto substrates with very little setup involved.
Pulsed Laser Deposition technique leads to efficient, none-thermal ablation and preserves the stoichiometry of the target materials. By applying this method it could deposit materials such as nitrides, oxides, super lattices, polymers, and composites.
